Certain factors associated with blister blight resistance in Camellia sinensis (L.) O. Kuntze |
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| Authors: | P.R. Jeyaramraja P.K. Pius S. Manian S. Nithya Meenakshi |
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| Affiliation: | aDepartment of Industrial Biotechnology, Karpagam Arts and Science College, Eachanari Post, Coimbatore 641 021, India;bPlant Physiology Division, UPASI Tea Research Foundation, Valparai 642 127, India;cDepartment of Botany, Bharathiar University, Coimbatore 641 046, India |
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| Abstract: | The role played by certain factors, physical barriers and chitinase enzyme, associated with blister blight resistance in tea was investigated. The blister blight resistance of the tea clone SA-6 was due to higher amounts of epicuticular wax and increased thickness of cuticle/epidermal layer, functioning as physical barriers to hyphal penetration of Exobasidium vexans. Higher quantum of chitinase in intercellular spaces of palisade tissues was observed in the resistant clone SA-6 through immunolocalization study. Both chitinase assay as well as western blotting studies confirmed that the constitutive level of chitinase expression was higher in the resistant clone when compared with the susceptible tea clone. |
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| Keywords: | Tea Inter-cellular localization Constitutive expression Inducible expression Disease resistance |
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