| Abstract: | In the paper, the enhancing process of diamond nucleation by negative substrate bias in hot filament CVD system was analyzed. Combining theory related to plasma and collision, the effects of bias on enhancing diffusion of active ions on substrate surface were primarily investigated theoretically, and the relative formulas of diffusion coefficient and diffusive distance with bias were given. The results showed that diffusion coefficient and diffusive distance increased with raising of negative substrate bias. |
