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High carrier mobility in single-crystal plasma-deposited diamond
Authors:Isberg Jan  Hammersberg Johan  Johansson Erik  Wikström Tobias  Twitchen Daniel J  Whitehead Andrew J  Coe Steven E  Scarsbrook Geoffrey A
Affiliation:ABB Group Services Center, Corporate Research, Nanotechnology and Innovative Materials Group, V?ster?s, Sweden. jan.isberg@angstrom.uu.se
Abstract:Room-temperature drift mobilities of 4500 square centimeters per volt second for electrons and 3800 square centimeters per volt second for holes have been measured in high-purity single-crystal diamond grown using a chemical vapor deposition process. The low-field drift mobility values were determined by using the time-of-flight technique on thick, intrinsic, freestanding diamond plates and were verified by current-voltage measurements on p-i junction diodes. The improvement of the electronic properties of single-crystal diamond and the reproducibility of those properties are encouraging for research on, and development of, high-performance diamond electronics.
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