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Low-temperature dyeing of silk fabric using atmospheric pressure helium/nitrogen plasma |
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| Authors: | M. D. Teli Kartick K. Samanta Pintu Pandit S. Basak S. K. Chattopadhyay |
| Affiliation: | 1. Department of Fibres and Textile Processing Technology, Institute of Chemical Technology, Mumbai, 400019, India 2. Plasma Nanotech Lab, Chemical and Bio-chemical Processing Division, ICAR-Central Institute for Research on Cotton Technology, Mumbai, 400019, India 3. Chemical and Bio-chemical Processing Division, ICAR-National Institute of Research on Jute and Allied Fibre Technology, Kolkata, 700040, India |
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