首页 | 本学科首页   官方微博 | 高级检索  
     检索      

硅对甘蔗黑穗病菌的体外抑菌效果研究
引用本文:王文举,孙婷婷,岑光莉,娄文月,陈燕玲,阙友雄,尤垂淮,苏亚春.硅对甘蔗黑穗病菌的体外抑菌效果研究[J].热带作物学报,2021,42(12):3588-3597.
作者姓名:王文举  孙婷婷  岑光莉  娄文月  陈燕玲  阙友雄  尤垂淮  苏亚春
作者单位:1.福建农林大学农业农村部福建甘蔗生物学与遗传育种重点实验室,福建福州 3500022.福建省病原真菌与真菌毒素重点实验室(福建农林大学),福建福州 3500023.福建农林大学生命科学学院,福建福州 350002
基金项目:国家重点研发计划项目(2018YFD1000503);福建省病原真菌与真菌毒素重点实验室(福建农林大学)开放课题(114/PTJH13004);国家糖料产业技术体系建设专项(CARS-17)
摘    要:由鞭黑粉菌(Sporisorium scitamineum)引起的黑穗病是甘蔗(Saccharum spp.)生产上最重要的真菌病害。硅是植物生长过程中的有益矿质元素,能够提高植物对生物和非生物胁迫的抗性。目前,关于外源硅对甘蔗黑穗病菌的体外抑菌作用尚未见报道。本研究以硅酸钠(sodium silicate, Na2SiO3)和硅酸钾(potassium silicate, K2SiO3)处理甘蔗黑穗病菌,观察黑穗病菌的孢子萌发、菌落直径和菌丝生长情况,评价不同硅剂和pH对甘蔗黑穗病菌的体外抑菌效果。结果显示,0.5~20.0 mmol/L Na2SiO3和K2SiO3均完全抑制甘蔗黑穗病菌的孢子萌发,但1.0 mmol/L Na2SiO3促进甘蔗黑穗病菌菌落和菌丝的生长,10.0、20.0 mmol/L Na2SiO3和K2SiO3则显著抑制菌落和菌丝的生长,表明Na2SiO3和K2SiO3均会影响甘蔗黑穗病菌的生长,高浓度Na2SiO3和K2SiO3的抑菌效果明显。在不同pH条件下,低pH(5.87~10.86)处理下的甘蔗黑穗病菌孢子有萌发,但其萌发率随着pH的增大逐渐降低,高pH(≥10.96)完全抑制孢子萌发,此外,pH为9.40和11.57对菌落直径的抑制效果明显。调整pH为6.0的低浓度Na2SiO3(0~5.0 mmol/L)和K2SiO3(0~3.5 mmol/L)对孢子萌发影响小,但pH为6.0的高浓度Na2SiO3(7.0~20.0 mmol/L)和K2SiO3(5.0~20.0 mmol/L)显著抑制孢子萌发,表明相同pH水平下的K2SiO3比Na2SiO3及其对应pH处理对甘蔗黑穗病菌孢子萌发的抑制作用更为明显。研究结果为外源硅在甘蔗抗黑穗病的药效试验和防治机理研究提供参考。

关 键 词:甘蔗黑穗病菌    pH  抑菌作用  
收稿时间:2021-05-17

Antifungal Effect of Silicon on Sporisorium scitamineum in vitro
WANG Wenju,SUN Tingting,CEN Guangli,LOU Wenyue,CHEN Yanling,QUE Youxiong,YOU Chuihuai,SU Yachun.Antifungal Effect of Silicon on Sporisorium scitamineum in vitro[J].Chinese Journal of Tropical Crops,2021,42(12):3588-3597.
Authors:WANG Wenju  SUN Tingting  CEN Guangli  LOU Wenyue  CHEN Yanling  QUE Youxiong  YOU Chuihuai  SU Yachun
Institution:1. Fujian Agriculture and Forestry University, Key Laboratory of Sugarcane Biology and Genetic Breeding (Fujian), Ministry of Agriculture and Rural Affairs, Fuzhou, Fujian 350002, China2. Key Laboratory of Pathogenic Fungi and Mycotoxins of Fujian Province (Fujian Agriculture and Forestry University), Fuzhou, Fujian 350002, China3. College of Life Sciences, Fujian Agriculture and Forestry University, Fuzhou, Fujian 350002, China
Abstract:Smut caused by Sporisorium scitamineum is the most important fungal disease in Saccharum spp. production. Silicon is a beneficial mineral element in plant growth, which can improve plant resistance to biotic and abiotic stresses. At present, the antifungal effect of exogenous silicon on S. scitamineum in vitro has not been reported. In this study, the spore germination, colony diameter and mycelium growth of the S. scitamineum were observed using sodium silicate (Na2SiO3) and potassium silicate (K2SiO3) to evaluate the antifungal effects of different silicon agents and pH on S. scitamineum in vitro. The spore germination of S. scitamineum was completely inhibited by 0.5-20.0 mmol/L Na2SiO3 and K2SiO3. The colony and hyphal growth of S. scitamineum were promoted by 1.0 mmol/L Na2SiO3, but was significantly inhibited by 10.0 mmol/L and 20.0 mmol/L Na2SiO3 and K2SiO3. The results suggested that Na2SiO3 and K2SiO3 could affect the growth of S. scitamineum, and high concentrations exhibited obvious antifungal effects. The spores could germinate at low pH (5.87-10.86), but the germination rate gradually decreased with the increase of pH. High pH (≥10.96) completely inhibited the spore germination. In addition, pH 9.40 and pH 11.57 significantly inhibited the colony growth. After adjusting pH to 6.0, low concentrations of Na2SiO3 (0-5.0 mmol/L) and K2SiO3 (0-3.5 mmol/L) had little effects on the spore germination, but high concentrations of Na2SiO3 (7.0-20.0 mmol/L) and K2SiO3 (5.0-20.0 mmol/L) significantly inhibited the spore germination. The results indicated that at the same pH level, the inhibition effect of K2SiO3 on the spore germination of S. scitamineum was better than that of Na2SiO3 and the corresponding pH treatment. This study would provide references for further pesticide effect test and control mechanism research on the resistance of sugarcane to smut.
Keywords:Sporisorium scitamineum  silicon  pH  antifungal effect  
点击此处可从《热带作物学报》浏览原始摘要信息
点击此处可从《热带作物学报》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号