首页 | 本学科首页   官方微博 | 高级检索  
     

香玲核桃离体叶片再生体系的建立
引用本文:邢瑞丹,李亚东,刘庆忠,李国田,陈新,陈明. 香玲核桃离体叶片再生体系的建立[J]. 果树学报, 2010, 0(1)
作者姓名:邢瑞丹  李亚东  刘庆忠  李国田  陈新  陈明
作者单位:山东省果树研究所;山东省果树生物技术重点实验室;吉林农业大学园艺学院;中国林业科学研究院林业研究所;山东农业大学生命科学学院;
基金项目:科技部平台项目:2005DKA21002-20;;农业部保种项目:NB08-2130135-09;;山东省农业良种工程项目:2008LZ010
摘    要:为解决核桃种质资源的实验室保存及转基因研究等问题,研究了暗培养时间、叶片放置方式及不同浓度激素组合(BA、NAA、TDZ)对香玲核桃叶片再生的影响。试验结果表明,最适宜的暗培养时间为14d;近轴面放置效果最好;不同组合的激素配比对叶片再生不定芽能力不同,最适宜香玲核桃叶片再生的培养基为:MS+BA0.5mg·L-1+NAA0.5mg·L-1+TDZ1.0mg·L-1+sucrose30g·L-1+agar6g·L-1,在该培养基上,离体叶片不定芽再生率达60%,每叶片平均再生不定芽数超过1.1个。筛选得到了香玲核桃离体叶片的最适分化及生根培养基,对离体再生培养条件进行优化,为香玲核桃的种质资源保存及遗传转化研究奠定了基础。

关 键 词:核桃  叶片  离体再生

Adventitious shoot regeneration from in vitro leaf of Juglans regia cv. Xiangling
XING Rui-dan,LI Ya-dong,LIU Qing-zhong,LI Guo-tian,CHEN Xin,CHEN Ming. Adventitious shoot regeneration from in vitro leaf of Juglans regia cv. Xiangling[J]. Journal of Fruit Science, 2010, 0(1)
Authors:XING Rui-dan  LI Ya-dong  LIU Qing-zhong  LI Guo-tian  CHEN Xin  CHEN Ming
Affiliation:1Shandong Institute of Pomology;Shandong Key Laboratory of Fruit Biotechnology Breeding;Taian;Shandong 271000 China;2Colledge of Horticulture;Jilin Agricultural University;Changchun;Jilin 130118 China;3Research Institute of Forestry;Chinese Academy of Forestry;Beijing 100091 China;4College of Life Science;Shandong Agricultural University;Shandong 271018 China
Abstract:Experiment was conducted with the leaves of walnut cultivar Xiangling as material for studying the best medium for adventitious shoot regeneration under dark culture conditions. The result showed that the optimum dark incubation time was 14 d,and using the adaxial leaf touching medium was better for regeneration. The optimum medium was MS + BA 0.50 mg·L-1 +NAA 0.5 mg·L-1+TDZ 1.0 mg·L-1+sucrose 30 g·L-1+ agar 6 g·L-1,on this medium in vitro the adventitious shoot frequency of regeneration could reach 60%,and the shoot number per. explant was more than 1.1.
Keywords:Walnut  Leaf  Regeneration in vitro  
本文献已被 CNKI 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号