| 糙毛假地豆耐荫性研究 |
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| 引用本文： | 崔炳权,陈兆平.糙毛假地豆耐荫性研究[J].中国生态农业学报,2000,8(2):58-61. |
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| 作者姓名： | 崔炳权 陈兆平 |
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| 作者单位： | 华南师范大学生物系,广州,510631 |
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| 基金项目： | 广东省科技厅科技攻关项目，广东省高教厅科研项目 |
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| 摘 要： | 采用不同遮荫方法试验研究了多年生豆科草本植物糙毛假地豆(Desmodium heterocapum DC var.strigosum Van Meeuwen)在弱光下生长发育、光-光合曲线、叶绿素含量及固N活性的变化,结果表明糙毛假地豆耐荫性较强,适于在约20%遮荫条件下生长.
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| 关 键 词： | 糙毛假地豆 耐荫性 遮荫 |
| 修稿时间： | 1998-06-17 |
The shade-resistance of Desmodium heterocapum DC var.strigosum Van Meeuwen |
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| Cui Bingquan and Chen Zhaoping.The shade-resistance of Desmodium heterocapum DC var.strigosum Van Meeuwen[J].Chinese Journal of Eco-Agriculture,2000,8(2):58-61. |
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| Authors: | Cui Bingquan and Chen Zhaoping |
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| Institution: | Department of Biology,South China Normal University,Guangzhou 510631;Department of Biology,South China Normal University,Guangzhou 510631 |
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| Abstract: | Under shading,the changes of chlorophyll,photosynthetic light response curves,growth,development and nitrogen fixation activity of Desmodium heterocapum DC var. strigosum Van Meeuwen were studied. The results showed that is was a strong shade-resistant legum,20% shading was suitable for its growth. |
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