首页 | 本学科首页   官方微博 | 高级检索  
     

外源 H2O2处理对两种小麦叶绿素荧光和叶绿素的影响
引用本文:卢 金 黄家钿 王艳芳等. 外源 H2O2处理对两种小麦叶绿素荧光和叶绿素的影响[J]. 安徽农业科学, 2014, 0(1): 9-11,45
作者姓名:卢 金 黄家钿 王艳芳等
作者单位:[1]宁波卫生职业技术学院医学技术学院,浙江宁波315104 [2]西北师范大学生命科学学院,甘肃兰州730070
基金项目:甘肃省自然科学基金项目(1010RJZA027).
摘    要:[目的]研究不同浓度H2O2处理对2种小麦幼苗叶绿素荧光和叶绿素的影响。[方法]以小麦品种宁春四号和西旱二号幼苗为材料,采用室内水培试验。[结果]对于宁春四号,200μmol/LH2O2处理使得初始荧光(FO)、最大荧光(Fm)、PSI处调节性能量耗散的量子产量Y(NPQ)、光化学淬灭(qP)和非光化学淬灭(NPQ)明显低于对照;不同浓度的H2O2处理使得幼苗叶片叶绿素a(Chla)、叶绿素b(Chlb)和叶绿素总量均显著降低。50、100和200μmol/LH3O2处理下西旱二号幼苗叶片Chla含量和F0显著降低,PSI的最大量子产量(Fv/Fm)、实际光化学反应效率(1,(II))、电子传递速率(ETR)、qP和ⅣPQ均增大,而Chlb和叶绿素总量无显著变化。[结论]与宁春4号相比,外源H2O2胁迫使西旱2号小麦幼苗叶片PSⅡ反应系统更开放,光合机构的损伤较严重。

关 键 词:过氧化氢  叶绿素  叶绿素荧光

Effects of H2O2 oH Chlorophyll Cluorescenceo and Chlorophyll in Wheat
Affiliation:LU Jin et al ( School of Medical Technology, Ningbo College of Health Sciences, Ningbo, Zhejiang 315104)
Abstract:[ Objective ] To study the effects of different concentration H2O2 treatments on chlorophyll flttorescenceo and chlorophyll of seedlings of two kinds of wheat. [ Method] With Ningehun 4 and Xihan 2 seedlings as material, hydroponic experiment was conducted. [ Result] FO, Fro, Y (NPQ), Photochemical quenching (qP), Nonphotochemical quenching (NPQ) significantly decreased under 200 μmol/L H2O2 treatment in comparison with the control, but remarkable reductions in Chla, ehlorophyUb and total chlorophyl/was observed in Ningchun under different H2O2 concentration. 50, 100 and 200 μmol/L H2O2 resulted in decreased chlorophyll a content, F0 was observed decreased to different H2O2 concentration, there was an increase of Fv/Fm, Y( I]), ETR, qP and NPQ in response to different H2O2 concentration as com- pared with untreated wheat, while no significant changes in chlorophyll b and total chlorophyll. [ Conclusion] Exogenous H2O2 treatment resuited PS 11 reaction system more open, and photosynthetic apparatus were damaged more in the mine population in Xihan 2 seedlings, in comparison with Ningehun 4 seedlings.
Keywords:H2O2  Chlorophyll  Chlorophyll fluorescenceo
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号