| 离子注入对洋葱表皮细胞形态的影响 |
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| 引用本文： | 胡纯栋,姚秀鸾,余增亮.离子注入对洋葱表皮细胞形态的影响[J].安徽农业大学学报,1991(4). |
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| 作者姓名： | 胡纯栋 姚秀鸾 余增亮 |
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| 作者单位： | 中国科学院等离子体物理研究所
(胡纯栋，姚秀鸾)，中国科学院等离子体物理研究所(余增亮) |
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| 摘 要： | 本文讨论了离子束与生物体相互作用动态分析仪的物理方案及参量设计,提出了由微波(2.45GHz)激发等离子体,放电室尺寸远小于TE或TM谐振模式的ECR离子源模式,采用永久磁铁的会切场磁场位形产生高密度的等离子体。利用二电极引出系统引出N~+离子流密度高达16mA/cm~2,总离子流1.1mA。通过聚焦,离子束斑直径为0.2mm,并进行了离子束与洋葱表皮细胞相互作用情况显微观察与摄影。
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| 关 键 词： | 洋葱表皮细胞 ECR N~+注入 |
EFFECT OF ION BEAM IMPLANTATION ON MORPHOLOGY OF EPIDERMAL CELLS OF ONION |
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| Hu Chundong,Yao Xiuluan,Yu Zengliang Institute of Plasma Physics,Academia Sinica.EFFECT OF ION BEAM IMPLANTATION ON MORPHOLOGY OF EPIDERMAL CELLS OF ONION[J].Journal of Anhui Agricultural University,1991(4). |
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| Authors: | Hu Chundong Yao Xiuluan Yu Zengliang Institute of Plasma Physics Academia Sinica |
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| Abstract: | The pholess of ion beam dynamic implantation into plant cells is discussed in the present paper. ECR ion source were excited by microwave(2.45GHz), The discharge chamber diameter of ECR ion source to whichmicrowave were introduced by wave guide and vacuum window was smallerthan for TE modes. The magnetic structure was built with NdFeB permanentwhere the magenetization M is perpendicular with source axis. This cuspstructure could be used to produce N~+ ion current of 1.1 mA (ion currentdensity of 16 mA/cm~2) at an extraction voltage of 8kv with an apertureof 3mm diameter by a two grid system. Focused ion beam diameter was0.2mm. |
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| Keywords: | Epidermal cells of onion ECR N~+ implantation |
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