首页 | 本学科首页   官方微博 | 高级检索  
     检索      

移栽时间对日光温室有机基质盘栽韭菜生长和产量的影响
引用本文:许贞杭,李坤,韩道杰,王英华,于贤昌.移栽时间对日光温室有机基质盘栽韭菜生长和产量的影响[J].中国蔬菜,2009,1(4):56-59.
作者姓名:许贞杭  李坤  韩道杰  王英华  于贤昌
作者单位:山东农业大学园艺科学与工程学院,作物生物学国家重点实验室,泰安 271018
基金项目:山东省农业科技成果转化资金项目 
摘    要:以4个韭菜品种为试材,采用日光温室有机基质盘栽的方法研究了移栽时间对韭菜生长和产量的影响。结果表明,适当提早或延迟移栽时间有利于促进日光温室有机基质盘栽韭菜株高、茎粗和产量的增加,11月24日移栽的韭菜生长最好,产量最高;随着移栽时间的延迟,韭菜新根数和新根长度均下降,韭菜叶宽逐渐增加,而叶片数变化较小。4个韭菜品种对不同移栽时间的响应关系与韭菜品种的休眠特性和根株贮藏养分的多少有关。与791、紫根红和新独根红相比,平韭2号生根较快、生长势较强、产量较高。

关 键 词:韭菜  移栽时间  有机基质盘式栽培  生根生长  产量  
收稿时间:2008-03-31;

Effects of Transplanting Time on Growth and Yield of Chinese Chive Cultivated in Plate with Organic Substrate in Greenhouse
XU Zhen-hang,LI Kun,HAN Dao-jie,WANG Ying-hua,YU Xian-chang.Effects of Transplanting Time on Growth and Yield of Chinese Chive Cultivated in Plate with Organic Substrate in Greenhouse[J].China Vegetables,2009,1(4):56-59.
Authors:XU Zhen-hang  LI Kun  HAN Dao-jie  WANG Ying-hua  YU Xian-chang
Institution:College of Horticulture Science and Engineering,Shandong Agricultural University;State key Laboratory of Crop Biology,Tai’an 271018,Shandong,China
Abstract:A greenhouse experiment was conducted to study effects of transplanting time on growth and yield of Chinese chive cultivated in plate filled with organic substrate.The results indicated that properly advancing or putting off the transplanting time could increase plant height,stem diameter and yield of Chinese chive and that trangplanting time of November 24 was the best.With transplanting time deferred,number and length of new roots decreased but leaf width increased,leaf number changed little.There was a responding relation between transplanting time and Chinese chive variety,which may be related to dormancy characteristic of Chinese chive variety and the nutrition accumulated in rhizoma and roots.Rhizogenesis,growth and yield of‘Pingjiu No.2’were higher than those of‘791’,‘Zigenhong’,and‘Xindugenhong’.
Keywords:
本文献已被 万方数据 等数据库收录!
点击此处可从《中国蔬菜》浏览原始摘要信息
点击此处可从《中国蔬菜》下载免费的PDF全文
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号