玉米播种机排种监测的试验研究与设计

在对目前玉米播种机排种监测方法的研究基础上,设计了一套新的玉米播种机排种监测的试验方法:将4对光电传感器并排安装在导种管内壁以监测空或堵的情况并进行报警;同时,利用安装在排种盘的中心轴上的空心转速编码器,测出排种盘转速连同试验所得的空穴率,从而得出玉米排种量。试验结果表明:该方案模拟实际空或堵的报警率达100%,排种量检测平均精度98.37%,各项性能指标均达到了实际要求。     

烟苗移栽机性能综合量化评价研究——基于AHP和田间测试

针对自走式烟苗移栽机选型排序问题,依据国家相关标准和实际选型测试试验,采用AHP理论及1~9标度方法构建了其三级评价指标体系。通过构造评价指标的判断矩阵,计算多个专家相对权重系数,得到了各评价指标的权重值,并对测试试验数据进行了百分制的评分量化处理,最终对13种型号移栽机的综合作业水平量化评价指数(SQEI)进行了计算和选型排序。评价结果表明:SQEI包含了作业效果、作业效率和作业效益的综合量化,为移栽机的选型排序工作确定了一种较为科学合理、客观、简便的评价方法。     

玉米深松全层施肥种行旋耕播种机关键部件的设计

针对目前国内玉米播种机存在播种深度不一致的问题,为了提高玉米播种播深一致性及播种质量,设计了一种旋耕种行玉米播种机。该机可以实现深松、分层施肥、旋耕种行、开沟、播种及覆土镇压等功能,一次性完成的播种作业,适用于大田作业。该机结构简单,使用时调整方便。田间试验表明:整机结构设计合理,可以达到精量播种,符合农民种植要求。     

基于CPLD的漏播检测装置的设计与测试

针对现有漏播检测装置并行性差、响应速度慢等不足,提出一种新型的漏播检测装置。该装置采用复杂可编程逻辑器件(CPLD)作为检测控制核心,能够同时提供8路落种检测,适用于大型精密穴播机械。该检测装置采用光电器件作为落种传感器,响应快速准确。6对红外对管采用特殊方式排列在排种管的相对两侧,避免光线干涉,提高检测精度。该装置适用于检测直径3mm以上种子(如麦粒、黄豆、玉米粒等),能够配合上位机GPS精确定位漏播位置,为漏播后的补种修正提供位置和数目信息。手工落种测试时,对小麦、黄豆、玉米种子的检出率可达100%。将该装置在播种试验台上进行实验,统计自动落种数目,精度可达95%以上;对单粒漏播进行报警统计,精度可达80%以上。改进试验台实验条件,以自适应方式运行可以使装置的检测精度进一步提升。     

Characterization of multidrug resistant Salmonella recovered from diseased animals

Three hundred and eighty Salmonella isolates recovered from animal diagnostic samples obtained from four state veterinary diagnostic laboratories (AZ, NC, MO, and TN) between 2002 and 2003 were tested for antimicrobial susceptibilities and further characterized for bla(CMY) beta-lactamase genes, class 1 integrons and genetic relatedness using PFGE. Forty-seven serovars were identified, the most common being S. Typhimurium (26%), S. Heidelberg (9%), S, Dublin (8%), S. Newport (8%), S. Derby (7%), and S. Choleraesuis (7%). Three hundred and thirteen (82%) isolates were resistant to at least one antimicrobial, and 265 (70%) to three or more antimicrobials. Resistance was most often observed to tetracycline (78%), followed by streptomycin (73%), sulfamethoxazole (68%), and ampicillin (54%), and to a lesser extent chloramphenicol (37%), kanamycin (37%), amoxicillin-clavulanic acid (20%), and ceftiofur (17%). With regards to animal of origin, swine Salmonella isolates displayed the highest rate of resistance, being resistant to at least one antimicrobial (92%), followed by those recovered from turkey (91%), cattle (77%), chicken (68%), and equine (20%). Serovars commonly showing multidrug resistance (MDR) to > or =9 antimicrobials were S. Uganda (100%), S. Agona (79%), and S. Newport (62%), compared to S. Heidelberg (11%) and S. Typhimurium (7%). Class-1 integrons were detected in 43% of all isolates, and were found to contain aadA, aadB, dhfr, cmlA and sat1 gene cassettes alone or in various combinations. All ceftiofur resistant isolates (n=66) carried the bla(CMY) beta-lactamase gene. A total of 230 PFGE patterns were generated among the 380 isolates tested using XbaI, indicating extensive genetic diversity across recovered Salmonella serovars, however, several MDR clones were repeatedly recovered from different diseased animals.     

Prevalence of virulence genes in Escherichia coli strains recently isolated from young pigs with diarrhea in the US

Enterotoxigenic Escherichia coli (ETEC)-associated post-weaning diarrhea (PWD) is economically one of the most important diseases for the swine industry. Porcine ETEC strains typically express K88 or F18 fimbria and heat-labile (LT) and/or heat-stable (STa, STb) enterotoxins. However, recent studies indicate that EAST1 toxin, adhesin involved in diffuse adherence (AIDA-I) and porcine attaching and effacing-associated factor (paa) may also be expressed by ETEC strains associated with diarrhea. To better understand the virulence factors of E. coli strains that cause PWD, we applied PCR to screen for K88, F18, F41, 987P and K99 fimbrial genes; LT, STa, STb, Stx2e and EAST1 toxic genes; and AIDA-I, paa and EAE adhesin genes in E. coli strains recently isolated from young pigs with PWD in the US. Of 304 E. coli isolates from diarrheic pigs submitted for testing, 175 (57.6%) strains possessed fimbrial genes: K88 (64.6%), F18 (34.3%), F41 (0.57%), K99 (0.57%), 987P (0); toxin genes: LT (57.7%), STb (72.6%), STa (27.4%), STx2e (17.4%), EAST1 (35%); and adhesin genes: AIDA-I (26.9%), paa (60%), EAE (1.1%). All toxin genes except the EAST1 toxin gene, were almost exclusively associated with K88+ or F18+ isolates, and most of these isolates carried multiple toxin genes. The non-fimbrial adhesin paa was found present in over half of the K88+ isolates. A total of 129 (42%) isolates carried no fimbrial genes, including 66 (21.7%) isolates that did not have any of the above virulence genes. These results suggest a broad array of virulence genes associated with PWD in pigs.     

除草剂莠去津降解菌SFAD3的分离鉴定及其土壤修复潜力

为获得能够修复除草剂莠去津污染土壤的高效降解菌,采用摇瓶富集法、平板分离法从莠去津过量使用的土壤中分离得到降解菌SFAD3,通过形态学、生理生化特征观察以及16S rDNA和ITS序列分析进行种类鉴定,测定获得菌株的最适降解条件,并通过土壤接种和盆栽试验验证菌株对莠去津污染土壤的修复作用。结果表明,菌株SFAD3最终被鉴定为门多萨假单胞菌Pseudomonas mendocina,该菌株培养30 d时对污染土壤中50 mg/kg莠去津的降解率可达72.6%;菌株SFAD3在MM液体培养基中最适降解条件为温度37℃、pH 7、莠去津初始浓度6.25 mg/L、接种量2%,对莠去津降的降解率为50.0%～72.2%;与仅有莠去津的处理相比,添加有SFAD3发酵液的处理20 d后芝麻的株高、根长、湿重和干重能够显著恢复,并且该菌对芝麻还具有一定的促生作用。表明降解菌SFAD3在修复莠去津污染土壤方面具有潜在的应用价值。     

Application and mechanisms of metal-based nanoparticles in the control of bacterial and fungal crop diseases

Nanotechnology is a young branch of the discipline generated by nanomaterials. Its development has greatly contributed to technological progress and product innovation in the field of agriculture. The antimicrobial properties of nanoparticles (NPs) can be used to develop nanopesticides for plant protection. Plant diseases caused by bacterial and fungal infestations are the main types of crop diseases. Once infected, they will seriously threaten crop growth, reduce yield and quality, and affect food safety, posing a health risk to humans. We reviewed the application of metal-based nanoparticles in inhibiting plant pathogenic bacteria and fungi, and discuss the antibacterial mechanisms of metal-based nanoparticles from two aspects: the direct interaction between nanoparticles and pathogens, and the indirect effects of inducing plant resilience to disease. © 2022 Society of Chemical Industry.