| 化学气相沉积金刚石薄膜的表面过程 |
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| 引用本文： | 唐璧玉,靳九成.化学气相沉积金刚石薄膜的表面过程[J].湖南农业大学学报(自然科学版),1996,23(4). |
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| 作者姓名： | 唐璧玉 靳九成 |
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| 作者单位： | 湖南大学化学化工系 |
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| 摘 要： | 采用简单表面反应模式，对化学气相沉积金刚石薄膜的表面动力学过程进行了研究，得到了金刚石薄膜的沉积速率公式，揭示了影响薄膜生长的因素并由此讨论了金刚石薄膜生长的机制和规律。
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| 关 键 词： | 金刚石薄膜 化学气相沉积 吸附 解吸 |
Surface Processes of Diamond Thin Films by Chemical Vapor Deposition |
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| Tang Biyu,Jing Jiuchen,Xia Jintong,Cheng Shaohu,Cheng Zhongzhang.Surface Processes of Diamond Thin Films by Chemical Vapor Deposition[J].Journal of Hunan Agricultural University,1996,23(4). |
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| Authors: | Tang Biyu Jing Jiuchen Xia Jintong Cheng Shaohu Cheng Zhongzhang |
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| Abstract: | The surface kinetics was studied based on the simple diamond surface chemistry. It revealed effects of various factors on deposition processes and led to formula of deposition rate of diamond thin films. The mechanism and the rule of the diamond thin film |
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| Keywords: | diamond thin films chemical vapor |
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