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豆田残留除草剂氯嘧磺隆在土壤空间分布的研究
引用本文:高中超,匡恩俊,黄春艳,马星竹,张喜林,周宝库,刘峰.豆田残留除草剂氯嘧磺隆在土壤空间分布的研究[J].大豆科学,2010,29(1).
作者姓名:高中超  匡恩俊  黄春艳  马星竹  张喜林  周宝库  刘峰
作者单位:东北农业大学,资源与环境学院,黑龙江,哈尔滨,150030;黑龙江省农业科学院,土壤肥料与环境资源研究所,黑龙江,哈尔滨,150086;黑龙江省农业科学院,土壤肥料与环境资源研究所,黑龙江,哈尔滨,150086;黑龙江省农业科学院,科研处,黑龙江,哈尔滨,150086
基金项目:黑龙江省农业科技新工程重点资助项目(HNK2008);;引进国际先进农业科学技术计划资助项目(GKZ20082);;黑龙江省博士后基金资助项目(LBH-Z05234)
摘    要:分别在有除草剂污染的豆田土壤和无除草剂污染的正茬土壤分层采集土壤样本,在盆栽条件下种植甜菜,鉴定农药残留。结果表明:大豆田土壤中残留的氯嘧磺隆主要分布在0~20 cm土层中,残留量随着土层深度的增加逐渐减少。其中0~10 cm土层植株生长到4叶期全部死亡,表明该层残留农药最多;10~20 cm土层对甜菜生长产生严重抑制,表现为株高降低37%,鲜重降低31.7%;20 cm以下土层的甜菜正常生长,该层氯嘧磺隆的残留量对下茬作物无明显影响。通过对特定指示作物甜菜苗期生长发育的研究揭示了豆田除草剂氯嘧磺隆在不同深度的分布特点,为进一步研究消除残留除草剂药害提供科学依据。

关 键 词:氯嘧磺隆  残留  土壤  甜菜生育

Soil Spatial Distribution of Residual Herbicide in Soybean Field and Its Effect on Beet Growth in Seedling Period
GAO Zhong-chao,KUANG En-jun,HUANG Chun-yan,MA Xing-zhu,ZHANG Xi-lin,ZHOU Bao-ku,LIU Feng.Soil Spatial Distribution of Residual Herbicide in Soybean Field and Its Effect on Beet Growth in Seedling Period[J].Soybean Science,2010,29(1).
Authors:GAO Zhong-chao  KUANG En-jun  HUANG Chun-yan  MA Xing-zhu  ZHANG Xi-lin  ZHOU Bao-ku  LIU Feng
Institution:1.Resources and Environmental Sciences College;Northeast Agricultural University;Harbin 150030;2.Soil and Fertilizer and Environmental Resource Institute of Heilongjiang Academy of Agricultural Sciences;Harbin 150086;3.Scientific Research Management Department of Heilongjiang Academy of Agricultural Sciences;Heilongjiang;China
Abstract:The experiment collected 0~40 cm soil with Chlorinuron-ethylon residue from soybean field to do the pot trial.The seedling rate,plant height,root length and weight of beet(Beta vulgaris)at seedling period were measured to study the spatial distribution of Chlorinuron-ethylon herbicide and its effect on other crops in soybean field.Results showed that the Chlorinuron-ethylon was mainly distributed in 0~20 cm soil,and the residual amount decreased with soil depth.The 0~20 cm soil showed significant phytotoxic...
Keywords:Chlorinuron-ethylon  Residual  Soil  Beet growth  
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