首页 | 本学科首页   官方微博 | 高级检索  
     检索      

薏苡耐盐性研究
引用本文:席国成,刘福顺,刘艳涛,冯晓洁,陈健,王庆雷.薏苡耐盐性研究[J].河北农业科学,2011(10):29-31.
作者姓名:席国成  刘福顺  刘艳涛  冯晓洁  陈健  王庆雷
作者单位:沧州市农林科学院;沧州市林业局
摘    要:目前我国有大面积的滨海盐化土壤尚未得到开发利用。薏苡是一种多用途植物,为了综合开发利用这一植物资源,我们对薏苡的耐盐性进行了初步研究,以明确薏苡在盐化土壤上种植的可能性。通过室内试验,测定了薏苡种子萌发期、出苗期和中后期的耐盐性;并利用盐池微区试验和田间小区试验,通过籽粒产量和秸秆产量2个指标,鉴定和验证了薏苡在不同程度盐化土壤上的适应性。结果表明:薏苡种子正常萌发的盐溶液浓度为7个大气压以下;在以氯离子为主的滨海盐化潮土上,薏苡正常出苗的土壤盐渍度为0.20%以下;苗期以后能够正常生长发育的土壤盐渍度为0.30%以下。薏苡可以在滨海轻度盐渍土壤上栽培或在中度盐渍土壤上进行保护性栽培。

关 键 词:薏苡  耐盐性  盐度

Study on Salt Tolerance of Coix Lacroyma-JobiL.
XI Guo-cheng,LIU Fu-shun,LIU Yan-tao,FENG Xiao-jie,CHEN Jian,WANG Qing-lei.Study on Salt Tolerance of Coix Lacroyma-JobiL.[J].Journal of Hebei Agricultural Sciences,2011(10):29-31.
Authors:XI Guo-cheng  LIU Fu-shun  LIU Yan-tao  FENG Xiao-jie  CHEN Jian  WANG Qing-lei
Institution:1(1.Cangzhou Academy of Agriculture and Forestry Sciences,Cangzhou 061001,China;2.Cangzhou Forestry Bureau,Cangzhou 061001,China)
Abstract:At present a large area of coastal salinized soil in China was not developed and utilized.Coix lacroyma-jobi L.was a multipurposal plant.In order to exploit and utilize comprehensively this resource,the salt tolerance was studied.The salt tolerance was determined at the germination stage,the seedling emergence stage and the middle-late period through laboratory experiments,and the grain yield and the straw yield were determined through saltpond micro-plot experiment and the field plot experiment.The results showed that the salt solution concentration for the normal seed germination was below 7 atmosphere pressure.The soil salinity for the normal seedling emergence was less than 0.20% and for the normal growth and development was less than 0.30% on the coastal salined flavo-aquic soil mainly with chloride ion.It was determined that C.lacroyma-jobi L.could be planted on the mild coastal salinized soil or planted protectively on the moderate salinized soil.
Keywords:Coix lacroyma-jobi L    Salt tolerance  Salinity
本文献已被 CNKI 维普 等数据库收录!
设为首页 | 免责声明 | 关于勤云 | 加入收藏

Copyright©北京勤云科技发展有限公司  京ICP备09084417号