半导体工业废水污染特征因子初探

指出了集成电路和印制电路板是半导体工业的主要组成部分，而在生产过程中会大量使用氢氟酸，使得虽经过处理后的生产废水中氟离子浓度仍较高，达到7 mg/L左右；通过将半导体企业排放废水与生活污水、地下水及地表水中氟离子浓度进行比较，提出了以氟离子浓度作为半导体工业废水的污染特征因子，并结合不同雨污混接类型污染特征因子，依据物料和水量守恒得出不同混接类型的近似混接水量比例计算公式，以期为后续的雨污混接溯源和雨污改造工程提供借鉴。

Preliminary Research of Characteristic Pollution Factor of Semiconductor Industry Wastewater

Integrated circuits and printed circuit boards are major components of the semiconductor industry ,and a great deal of hydrofluoric acid is used in the production process ,so that the fluorine ion concentration reaches 7 mg/L or so which is high in the production wastewater though it has been treated .Based on the comparison of the fluorine ion concentration of sewage discharge ,groundwater and surface water in the semiconductor industry ,this article takes the fluorine ion concentration as the pollution factor of production wastewater of the semiconductor industry ,and by combining with other tracer parameters of different types of non -stormwater entries into storm drainage systems ,it draws the formulas of illicit discharged water quantity according to the materials and quantity conservation ,which can describe the mixed ratios of different types of illegal discharge sources .The result will be much useful for the subsequent work of determing what types of mixed discharge sources and so does the renovation project .