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大豆种荚应答镰刀菌侵染的叶绿素荧光成像规律
引用本文:龙希洋,肖新力,张启辉,杨文钰,刘江,张静.大豆种荚应答镰刀菌侵染的叶绿素荧光成像规律[J].浙江农林大学学报,2020,37(3):540-546.
作者姓名:龙希洋  肖新力  张启辉  杨文钰  刘江  张静
作者单位:1.四川农业大学 农业部西南作物生理生态与耕作重点实验室,四川 成都 6111302.四川农业大学 生态农业研究所,四川 成都 6111303.四川农业大学 园艺学院,四川 成都 611130
基金项目:“十三五”国家重点研发计划重点专项(2016YFD0300209);国家自然科学基金资助项目(31971853);中国博士后科学基金资助项目(2017T100707)
摘    要:  目的  种荚是大豆Glycine max防御霉菌侵染的第1道防线,部分大豆品种种荚具有极佳的田间霉变抗性,本研究目的在于寻找与豆荚霉变抗性相关的快速鉴定指标。  方法  采用叶绿素荧光成像技术,以高抗大豆‘QWT15-2’、中抗大豆‘E1’和易感大豆‘E314’为研究对象,对离体种荚接种轮枝镰刀菌Fusarium verticillioides,监测其叶绿素荧光参数变化情况。  结果  大豆种荚接种霉菌24 h后,通过叶绿素荧光成像系统可清晰观察到豆荚表皮病斑,叶绿素荧光参数发生显著变化。霉菌侵染后0~5 d,大豆种荚初始荧光参数初始荧光(Fo)、最大荧光(Fm)、可变荧光(Fv)大幅降低,非光化学猝灭系数qN上升、QNP下降,最大光化学量子产量(Fv/Fm)、实际光化学效率(ΦPSⅡ)及电子传递速率(RET)均呈下降趋势。  结论  高抗大豆‘QWT15-2’维持了较健康的组织形态,各荧光参数表现稳定;中抗大豆‘E1’和感病大豆‘E314’受霉菌侵染影响,其表皮组织破坏严重、荧光参数变化幅度大;其中Fv/Fm、Fm、Fv、qN和QNP荧光参数对霉菌侵染响应敏感,可作为评价大豆种荚田间霉变抗性的鉴定指标。图4参17

关 键 词:大豆    种荚    轮枝镰刀菌    叶绿素荧光成像    抗性鉴定
收稿时间:2019-05-20

Imaging rules in chlorophyll fluorescence of soybean pods in response to Fusarium verticillioides
LONG Xiyang,XIAO Xinli,ZHANG Qihui,YANG Wenyu,LIU Jiang,ZHANG Jing.Imaging rules in chlorophyll fluorescence of soybean pods in response to Fusarium verticillioides[J].Journal of Zhejiang A&F University,2020,37(3):540-546.
Authors:LONG Xiyang  XIAO Xinli  ZHANG Qihui  YANG Wenyu  LIU Jiang  ZHANG Jing
Affiliation:1.Key Laboratory of Crop Ecophysiology and Farming System in Southwest, Ministry of Agriculture, Sichuan Agricultural University, Chengdu 611130, Sichuan, China2.Institute of Ecological Agriculture, Sichuan Agricultural University, Chengdu 611130, Sichuan, China3.College of Horticulture, Sichuan Agricultural University, Chengdu 611130, Sichuan, China
Abstract:  Objective  The current study, in order to establish the index for the rapid identification of the resistance of soybean pods, is focused on three cultivars of cultivars, namely the high-resistant cultivar ‘QWT15-2’, the medium-resistant cultivar ‘E1’ and the sensitive cultivar ‘E314’.  Method  The pods were first inoculated with Fusarium verticillioides in vitro, and then the changes of chlorophyll fluorescence parameters in pods were monitored with the employment of chlorophyll fluorescence imaging technology.  Result  After 24 hours of inoculation, the epidermal lesions of the pods were clearly observed through the chlorophyll fluorescence imaging system, and there was a significant change in the fluorescence parameters. To be specific, 0?5 days after mold infection, there was a significant decrease in the initial fluorescence parameters Fo, Fm, Fv of soybean pods, an increase in the non-photochemical quenching coefficient qN and a decrease in QNP, which was accompanied with an inclination of decline in the maximum photochemical efficiency Fv/Fm, actual photochemical efficiency ΦPSⅡ and electron transport rate RET.  Conclusion  The high-resistant culivar ‘QWT15-2’ maintained a relatively healthy tissue with stable fluorescence parameters. The medium-resistant cultivar ‘E1’ and the sensitive cultivar ‘E314’ were affected by mold infection with severe epidermal tissue damage and significant change in the fluorescence parameters. Fluorescence parameters such as Fv/Fm, Fm, Fv, qN and QNP are sensitive to mold infection and can be used as an indicator to evaluate the resistance of soybean pods in the field. Ch, 4 fig. 17 ref.]
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